This is an archive of requests from 2013 to 2021. New requests are not being added here.
| PROM Request Title | PROM Date | PROM Request Summary | Equipment List | PROM Decision |
|---|---|---|---|---|
| Use of Micro Chem SU8 | 02/19/2020 (all day) | Request to bring in SU-8 (not stocked by SNF). | Request approved. Please see process staff for details. | |
| Use of TMSB in SNF | 02/14/2020 (all day) | Request to aerosolize Silver in Mister Mister in SNF. | Request withdrawn. Please see process staff for details. | |
| Wet Etch of BTO Thin Film Using BOE+HNO3+DI | 02/10/2020 (all day) | Request to do a chemical process similar to HNA in the SNF. | Request approved. Please see process staff for details. | |
| 20200207 A. Piazza- HFE7100 for use in wbflex-solv | 02/07/2020 (all day) |
Request to bring in new chemistry for use with nanoscribe resists |
Wet Bench Flexible Solvents 1 (wbflexsolv-1) | Approved. |
| Request to use Ostemer 324 and 322 in Mavericks 155 | 02/07/2020 (all day) | Request to bring in Crystal Clear Chemistries for use in 155. | Request approved. Please see process staff for details. | |
| HFE7100 for use in wbflex-solv | 02/07/2020 (all day) | Request to bring in new chemistry for use with nanoscribe resists | Approved. | |
| Use of RTV-615 in Mavericks 155 | 02/07/2020 (all day) | Request to bring in new chemistry for use in 155. | Request approved. Please see process staff for details. | |
| Bring in, store, and process Si wafers from Rogue Valley Microdevices | 02/05/2020 (all day) | Request to bring in wafers from a new vendor. |
Wet Bench Flexible Solvents (wbflexsolv), Wet Bench Flexcorr 1 (wbflexcorr-1), Wet Bench Clean_res-piranha (wbclean_res-piranha) |
Requestor developed process flow with no clean equipment required so PROM approval not needed. Requst is archived for future reference. |
| BiSbTe etch in Ox-35 | 02/03/2020 (all day) | Contamination evaluation plan documented to introduce Bi into Ox-35 etcher. | Oxford III-V etcher (Ox-35) | PROM Request is approved with no special requirements around processing. BiSbTe does contaminate the etch chamber, but contaminants can be removed with the cleaning procedures documented. All users of the Ox-35 who will go to the MOCVD equipment a... |
| Request to use PVA in SNF | 01/31/2020 (all day) | Request to bring PVA for use in SNF tools. | Request approved. Please see process staff for details. |