This is an archive of requests from 2013 to 2021. New requests are not being added here.
PROM Request Title PROM Date PROM Request Summary Equipment List PROM Decision
Bring in and Store negative e-beam resists ma-N 2403, AR-N 7520 11/25/2019 (all day) Request for new ebeam resists to be used in the Laurell only. Request approved. Please see process staff for details.
AZ n LoF2020 in SNF headway 11/20/2019 (all day) Request for new photoresist to be used in Headway. Headway Manual Resist Spinner (headway2),
Karl Suss MA-6 Contact Aligner (karlsuss),
Wet Bench Miscellaneous (wbmiscres)
Approved.
Use of Stycast Epoxy for Non-galvanic Flip-chip Bonding 11/15/2019 (all day) Documentation of procedure to use epoxy in flip-chip bonder. Wet Bench Miscellaneous (wbmiscres) Approved.
Introduction of Ni into Intlvac ebeam evaporator 11/15/2019 (all day) Request to add new metal to clean/semiclean evaporator. Intlvac Evaporator (Intlvac_evap) Request approved. Please see process staff for details.
Use of InP substrate in Fiji1 11/15/2019 (all day) Request documenting procedures to use InP substrate in Fiji1 (semiclean) Fiji 1 ALD (fiji1) Request approved. Please see process staff for details.
Use of Parylene N in parcoater 11/11/2019 (all day) Request to use alternate Parylene type PDS 2010 LABCOTER™ 2 Parylene Deposition System (parcoater) Approved.
NOA89 use in SNF litho area 11/07/2019 (all day) Request to bring new chemistry into SNF litho area Karl Suss MA-6 Contact Aligner (karlsuss),
Headway Manual Resist Spinner (headway2)
Approved.
Request to bring in baked KrF resist into ExFab 10/24/2019 (all day) Request to bring new materials into ExFab. Request approved. Please see process staff for details.
Request to use EKC 265 in SNF 10/10/2019 (all day) Documented protocol for using EKC265 in SNF. Approved.
Request to use TechniEtch CR01 in SNF 10/10/2019 (all day) Request to use perchloric acid containing chemistry in SNF. Request approved. Please see process staff for details.

Pages