This is an archive of requests from 2013 to 2021. New requests are not being added here.
| PROM Request Title | PROM Date | PROM Request Summary | Equipment List | PROM Decision |
|---|---|---|---|---|
| Use of AZ 125nxt photoresist | 03/25/2015 (all day) | Request to use AZ 125nxt resist in headway, karl suss, and SVG dev. |
Headway Manual Resist Spinner (headway2), Karl Suss MA-6 Contact Aligner (karlsuss), SVG Develop Track 1 (svgdev) |
Request approved. |
| AZ1518 Photoresist and AZ300MIF Developer in SNF | 03/23/2015 (all day) | Request to bring new AZ1518 resist and corresponding AZ300MIF developer. | Request approved. | |
| Wafers from outside fab to process in SNF clean tools | 03/19/2015 (all day) | Data submission as per SNF contamination policy. |
Wet Bench Clean 1 (wbclean-1), Fiji 1 ALD (fiji1) |
Request approved. |
| Process flow for etching Silicon Germanium on contaminated wafers with aluminum in LAMpoly (clean) | 03/16/2015 (all day) | Request to modify contamination policy and allow contaminated wafers on clean etcher. | Lam Research TCP 9400 Poly Etcher (lampoly) | Request approved for data collection. Data will be reviewed by PROM committee. |
| HF wet etch to peel off PMMA film embedding graphene composites | 02/23/2015 (all day) | Request to use wb-flexcorr to undercut and remove film with encpsulated graphene oxide particles. | Wet Bench Flexcorr 1 (wbflexcorr-1) | Request approved. |
| PbS in Fiji3 | 02/20/2015 (all day) | Request to use Fiji3 for processing of PbS films on carrier wafer. | Fiji 3 ALD (fiji3) | Request approved. As long as carrier wafer is used, processing on Fiji3 permitted even after Fiji2 is up. |
| Ultrasol 201A CMP Slurry | 02/19/2015 (all day) | Request to use new slurry for Al CMP in SNF. | CMP GnP POLI-400L (cmp) | Request approved. Slurry storage will not be in CMP room. |
| Al2O3 ALD on K(Co)-doped BaFe2As2 | 02/18/2015 (all day) | Request to introduce new materials into SNF. | Fiji 3 ALD (fiji3) | Request approved for Fiji2 at temperatures below 180C. |
| Ladder Polymers and Solvent | 02/18/2015 (all day) | Request to pattern and etch polymer film inside the SNF. Polymer deposition and solvent usage to be performed OUTSIDE the SNF. | Request approved. Dedicated glassware required. | |
| Annealing Thulium doped samples | 02/13/2015 (all day) | Request to anneal Thulium doped samples in tylan 9 and aw150-r. | Request approved. Oxidation cycle required after anneal in furnace. |