This is an archive of requests from 2013 to 2021. New requests are not being added here.
| PROM Request Title | PROM Date | PROM Request Summary | Equipment List | PROM Decision |
|---|---|---|---|---|
| Hybrid nanocomposite synthesis with polyimides | 06/02/2015 (all day) | Request to bring new polyimide materials into the SNF. |
Savannah ALD (savannah), Fiji 2 ALD (fiji2), Headway Manual Resist Spinner (headway2) |
Request approved. |
| Processing of Thulium Doped Structures | 05/27/2015 (all day) | Request to use wafers with Thulium doping in litho, etch, and cleans. Contamination evaluation plan documented. |
Plasma Therm Versaline LL ICP Metal Etcher (PT-MTL), Plasma Therm Versaline LL ICP Dielectric Etcher (PT-Ox) |
Request approved. VPD ICPMS results to be reviewed by the PROM Committee. |
| Request to deposit amorphous TiO2 on SrTiO3 and LiNbO3 substrates in Inlvac-spt | 05/20/2015 (all day) | Request to do new film development on Intlvac-spt using new substrates (SrTiO3 and LiNbO3) | Request approved. Purchase and use of dedicated wafer holder required. | |
| Cyclotene XUS Replenishment | 05/18/2015 (all day) | Request to bring in new bottle of Cyclotene XUS. | Request approved. Please contact PROM Committee (snf-promcommittee at lists dot stanford dot edu) for more information | |
| Use of Aquapel in SNF | 05/15/2015 (all day) | Request to use Aquapel in SNF. | Wet Bench Miscellaneous (wbmiscres) | Request approved. |
| Ge2Sb2Te6 Sputter Target for Metallica | 04/23/2015 (all day) | Request for new GST target to be used on Metallica. | Request approved. | |
| Use of AZ Siloxane Negative Tone Resist | 04/14/2015 (all day) | Request to use AZ Siloxane S06.106 negative tone resist. | Request approved. Bottle inventory for the group will be managed to 7 bottles. Please contact PROM Committee (snf-promcommittee at lists dot stanford dot edu) for more information. | |
| Al2O3 ALD on TMD in MVD Savannah | 04/13/2015 (all day) | Request to do Al2O3 capping of exoliated TMD structures in an inert environment. | Request approved. | |
| OSCoR SL Stripper 200 | 04/03/2015 (all day) | Request to use Stripper 200 and supporting chemicals in order to enable processing on organic electronic materials. | Request approved. | |
| Lampoly HBr/Cl2/O2 etching of silicon on lithium niobate | 03/30/2015 (all day) | Request to etch Si on lithium niobate substrate. Contamination plan documented. | Lam Research TCP 9400 Poly Etcher (lampoly) | Request approved. Data to be reviewed by PROM committee. |