Chemical Formula:
C4F8
| Equipment name & NEMO ID | Cleanliness | Location | Primary Materials Etched | Other Materials Etched | Gases |
|---|---|---|---|---|---|
|
Oxford Plasma Pro ICP-RIE ALE Ox-ALE |
SNF Paul G Allen L107 Cleanroom | ||||
|
Oxford Plasma Pro ICP-RIE Ox Ox-Ox |
SNF Paul G Allen L107 Cleanroom |
|
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|
Plasma Therm Versaline LL ICP Deep Silicon Etcher PT-DSE |
SNF Paul G Allen L107 Cleanroom |
|
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|
Plasma Therm Versaline LL ICP Dielectric Etcher PT-Ox |
SNF Paul G Allen L107 Cleanroom |
No equipment matches all of the filter criteria you have set above.