Plasma Enhanced ALD uses a down stream plasma system to deliver reactive plasma gases as a co-reactant to the metal-organic precursors. 

A couple of useful links that help navigate ALD research in general (not specific to the SNF) are:

  • www.plasma-ald.com: a website created by Dr. Mark Sowa that has a survey of plasma ALD literature
  • www.atomiclimits.com: a website created by Professor Erwin Kessels, Eindhoven University, that provides a dynamic discussion of the ALD landscape.
Processing Technique Equipment name & NEMO ID Cleanliness Materials Lab Supplied Material Thickness Range Substrate Size Process Temperature Range Gases Notes Stylus Tip Radius
Plasma Enhanced (PE) ALD Fiji 1 ALD
fiji1 		Semiclean
1.00 Å - 50.00 nm
24 °C - 350 °C
Plasma Enhanced (PE) ALD Fiji 2 ALD
fiji2 		Flexible
1.00 Å - 50.00 nm
24 °C - 350 °C
Plasma Enhanced (PE) ALD Fiji 3 ALD
fiji3 		Flexible
1.00 Å - 50.00 nm
24 °C - 350 °C

Restricted to non-conductive films only