Processing Techniques Equipment name & NEMO ID Teaser Blurb Cleanliness Location
Resist Develop (manual), Wet Chemical Processing Ex Fab Develop Wet Bench
wbexfab_dev

Manual developing of photoresist using mainly MF-26A.

 Flexible SNF Exfab Paul G Allen L104 Stinson
Resist Develop (manual), Wet Chemical Processing Wet Bench Miscellaneous
wbmiscres

Manual developing of photoresist using mainly AZ1:1 developer.

 Flexible SNF Paul G Allen L107 Cleanroom