Manual spin coating is used in cases that are not covered under "standard" condiitions. Often this is used to experiment with new resists and/or materials. PROM approval is required for new material introduction.
| Processing Technique | Equipment name & NEMO ID | Cleanliness | Chemicals | Substrate Size | Maximum Load (number of wafers) | Resist | Notes | Stylus Tip Radius |
|---|---|---|---|---|---|---|---|---|
| Resist Coat (manual) |
Headway 3 Manual Resist Spinner headway3 |
"All" | 1 piece or wafer | |||||
| Resist Coat (manual) |
Headway Manual Resist Spinner headway2 |
"All" | one piece or wafer |
Adjustable spin speeds, spin time. SNF-acceptable resists or polymers. Ebeam resists |
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| Resist Coat (manual) |
Laurell Manual Resist Spinner laurell-R |
"All" |
SU-8, LOL, Ebeam resists allowed. No Acetone allowed. |