Plasma Enhanced ALD uses a down stream plasma system to deliver reactive plasma gases as a co-reactant to the metal-organic precursors. 

A couple of useful links that help navigate ALD research in general (not specific to the SNF) are:

  • www.plasma-ald.com: a website created by Dr. Mark Sowa that has a survey of plasma ALD literature
  • www.atomiclimits.com: a website created by Professor Erwin Kessels, Eindhoven University, that provides a dynamic discussion of the ALD landscape.
Processing Techniques Equipment name & NEMO ID Teaser Blurb Cleanliness Location
Plasma Enhanced (PE) ALD Fiji 1 ALD
fiji1

Fiji1 is a load-locked, plasma-enabled atomic layer deposition (ALD) system.

 Semiclean SNF Paul G Allen L107 Cleanroom
Plasma Enhanced (PE) ALD Fiji 2 ALD
fiji2

Fiji2 is a load-locked, plasma-enabled atomic layer deposition (ALD) system. Fiji2 is currently classified as Flexible and is open to a wide range of metals and dielectrics.

 Flexible SNF Paul G Allen L107 Cleanroom
Plasma Enhanced (PE) ALD Fiji 3 ALD
fiji3

The Fiji3 ALD system from Cambridge Nanotech/Ultratech is a plasma enabled atomic layer deposition system for deposition of restricted oxide films. The system is in the Flexible cleanliness category and allows a limited subset of gold contaminated substrates.

 Flexible SNF Paul G Allen L107 Cleanroom