MF26A is a resist developer that is a chemical blend that, amongst other chemicals, contains surfactant and 2.4% TMAH.

Partial words okay.
Equipment name & NEMO ID Training Required & Charges Cleanliness Location Chemicals Notes
Ex Fab Develop Wet Bench
wbexfab_dev
WbExfab_Dev Training
1.00 hours
SNF Exfab Paul G Allen L104 Stinson

Manual development of resist in beakers. SNF approved developers only. No solvents!

SVG Develop Track 1
svgdev
SVG Resist Develop tracks 1 and 2 Training
0.50 hours
SNF Paul G Allen L107 Cleanroom

Automatic development.

SVG Develop Track 2
svgdev2
SVG Resist Develop tracks 1 and 2 Training
0.50 hours
SNF Paul G Allen L107 Cleanroom

Automatic development.